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February 9, 2008

Mtg: Immersion and EUV Lithography

by @ 4:04 pm. Filed under ALL, Electronics Design, Engineering Mgmt, Optics/Displays, Semiconductors
 

WEDNESDAY February 27
SCV Electron Devices Chapter
Speaker: Dr. Geert Vandenberghe, IMEC
Time: 6:00 PM (Social), 6:30 PM (Presentation)
Cost: none
Place: National Semiconductor Corp. Building E1, Conference Center, 2900 Semiconductor Drive, Santa Clara
RSVP: not required
Web: www.ewh.ieee.org/r6/scv/eds

? Lithography is one of the key drivers of the device and circuit scaling in integrated circuits. For the 45nm half-pitch node, 193nm immersion lithography has clearly emerged on the company roadmaps as primary technology for patterning (more…)

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