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February 16, 2014

Mtg: Extreme Ultraviolet Photolithography

by @ 12:05 pm. Filed under ALL, NanoEngineering, Optics/Displays, Semiconductors
 

TUESDAY March 4, 2014
SCV Photonics Chapter
– density, feature size, power, transition plans …
Speaker: Mark Phillips, EUV lithography group, Intel
Time: Networking and Pizza at 6:00 PM, Presentation at 7:00 PM
Cost: none
Place: Intel Auditorium, Building SC-12, 3600 Juliette Lane, Santa Clara
RSVP: from website
Web: ewh.ieee.org/r6/scv/leos

Traditional optical lithography is reaching the limits of its resolution, and continuing improvements in integrated circuit density are becoming progressively harder.  For the past decade, the semiconductor industry has been working on (more…)

20140304scv

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