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May 29, 2009

Mtg: Where in the Nano-world is Lithography Taking Us?

by @ 8:50 am. Filed under ALL, Optics/Displays, Semiconductors
 

TUESDAY June 2, 2009
SCV Photonics (Lasers and Electro Optics) Chapter
Speaker: Dr. Harry J. Levinson, GLOBALFOUNDRIES
Time: Networking/Pizza at 6:00 PM, Presentation at 7:00 PM
Cost: none
Place: National Semiconductor Building E Auditorium, 2900 Semiconductor Drive, Santa Clara
RSVP: use web link for EventBrite
Web: www.ewh.ieee.org/r6/scv/leos

For decades, patterns of integrated circuits have been fabricated using optical lithography using near- to deep-ultraviolet light.? However, this method is approaching fundamental physical limits, in terms of the ability to print dense patterns directly.? The reasons for this are described, and the outlook for some of the alternatives currently being serious consideration, such as double patterning and extreme ultraviolet (EUV) lithography, are discussed. Included in the discussion will be economic as well as technical issues.

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