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June 30, 2011

Mtg: Nanofabrication of Bit-patterned Media by Block Copolymer Directed Assembly

by @ 2:52 pm. Filed under ALL, Computers/Software, NanoEngineering, Optics/Displays, Semiconductors
 

WEDNESDAY July 27, 2011
OEB Magnetics Chapter
Speaker: Ricardo Ruiz, Hitachi GST
Time: 3:00 PM
Cost: none
Place: Lawrence Berkeley National Labs
RSVP: required, by email to Kate Jenkins, cajenkins@lbl.gov
Web: ewh.ieee.org/r6/oeb/mag
Block copolymer directed self assembly continues to make advances that place this technology as a potential candidate for sub-20nm lithography. The naturally periodic features found in block copolymer films display superior size uniformity at ultra-high densities, making them ideal lithographic masks to define the highly periodic data bits in the data sectors of hard disk drives for bit patterned media (BPM) technology at densities beyond 1Tbit/in2. Nanofabrication challenges in magnetic BPM, however, reach far beyond pattern formation. I will review recent progress at Hitachi GST in all aspects involving template nanofabrication by directed assembly. These include control over feature size uniformity, bit shape, placement accuracy, metrology, distorted lattices on circular tracks, high fidelity pattern transfer, magnetic BPM fabrication, impact of bit size uniformity on the magnetic switching field distribution and, more recently, the fabrication of rectangular bits in a rectangular lattice. In all these aspects, the high uniformity of block copolymer patterns outperforms that of e-beam lithography alone bringing an exciting opportunity for self-assembly in time for bit patterned media technology.

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