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July 29, 2008

Mtg: Recent Developments in Large Arrays of Microcavity Plasma Devices: Physics and Applications

by @ 8:18 am. Filed under ALL, Communications, NanoEngineering, Optics/Displays, Semiconductors
 

THURSDAY September 18, 2008
SCV Lasers and Electro Optics Chapter
Speaker: Prof. J. Gary Eden, University of Illinois at Urbana-Champaign
Time: Networking and Pizza Social at 6:00 PM; Presentation at 7:00 PM
Cost: none
Place: KLA-Tencor Corporation, 3 Technology Drive, Milpitas
RSVP: through website
Web: www.ewh.ieee.org/r6/scv/leos

Microcavity plasma devices are a new class of hybrid plasma/optoelectronic device in which a non-equilibrium low temperature plasma is spatially confined to a microcavity with a characteristic cross-sectional dimension of nominally 10-200 µm. Plasmas so confined are stable glows having nanoliter volumes and operating at gas pressures up to and beyond one atmosphere. ? Conventional mass production techniques can be used to fabricate arrays of microplasma devices having precisely-controlled microcavity dimensions and dielectric structures, thereby tailoring the electric field within the microcavity. ? Arrays of microcavity plasma devices have been demonstrated in a wide range of materials and device structures including Si, glass, and ceramics, but this presentation will focus on recent results in our laboratory in which arrays having active areas >200 cm2 have been realized with Al2O3Al multilayer structures and plastic-based devices. Both are flexible and the latter are fully transparent. Furthermore, plasma channels having widths of 20 µm and aspect ratios >104:1 have been demonstrated. ? The performance of these arrays and selected applications in lighting, displays, and biomedical phototherapeutics will be discussed.

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