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September 24, 2007

Mtg: Compact High-Repetition-Rate Soft X-ray Lasers on a Table-Top

by @ 9:17 am. Filed under ALL, Electronics Design, Engineering Mgmt, Optics/Displays, Semiconductors
 

THURSDAY October 4
SCV Lasers and Electro-Optics Chapter
Speaker: Prof. Jorge Rocca, Colorado State University, and IEEE LEOS Distinguished Lecturer
Time: Networking and Food: 7:00 PM, Presentation: 8:00 PM
Cost: donation for refreshments
Place: SPECIAL LOCATION: with IEMT Symposium at the Holiday Inn San Jose, 1740 North First St, San Jose
RSVP: by email to ieeescvleos-rsvp2007@yahoo.com
Web: www.ewh.ieee.org/r6/scv/leos

This talk will review recent advances in high repetition rate soft x-ray lasers that allow the generation of very high brightness soft x-ray beams using table-top set ups. ? The peak spectral brightness of some of these new lasers can surpass that of third generation synchrotrons by orders of magnitude in the 25-100 eV photon energy region, enabling new applications. ? These advances include the demonstration of 5 Hz repetition rate table-top soft x-ray lasers producing intense beams at wavelengths ranging from 13.2 to 32.6 nm, and the observation of lasing at wavelengths down to 10.9 nm. ? The results were obtained by collisional electron impact excitation of highly ionized atoms in dense plasmas efficiently heated with picosecond optical laser pulses of only 1 J energy. In a separate development, the first of a new generation of extremely compact desk-top size capillary discharge soft x-ray lasers was demonstrated. ? It emits intense pulses of wavelength 46.9 nm light at 12 Hz repetition rate producing an average power of ~ 0.15 mW. ? The laser occupies a table area of about 0.4 x 0.4 square meters.

These new compact lasers are allowing a number of table-top experiments with intense soft x-ray light. These include the demonstration of broad area imaging with resolution down to 38 nm, nanoscale ablation of material, single photon ionization spectroscopy of molecules and nanoclusters, the metrology for the fabrication of the future generations of microprocessors using extreme ultraviolet lithography, and the diagnostics of dense plasmas by soft x-ray laser interferometry. ? Moreover the compact size of these new laser sources promises to make intense coherent soft x-ray light widely available, opening doorways to intense coherent soft x-ray science experiments on a table-top and to the development of new nanoscale metrology and processing tools for industry.

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