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Stanford Nanofabrication Facility
presented by Yoshio Nishi, Ph.D.
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The Stanford Nanofabrication Facility (SNF) is a state-of-the-art, shared-equipment, open-use resource that serves academic, industrial, and governmental researchers across the country and around the globe. SNF, in partnership with sister facilities across the country, form the National Nanotechnology Infrastructure Network (the NNIN). This is an NSF-funded initiative with the directive of providing state-of-the-art fabrication resources to researchers across the country. Lab members come from a wide variety of disciplines, with research in areas of optics, MEMS, biology, and chemistry, as well as process characterization and fabrication of more traditional electronics devices. The lab is especially committed to supporting the use of micro- and nanofabrication technologies in non-traditional research applications.
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| When: |
March 22, 2005
11:40 to 1:00 PM
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| Donation: |
IEEE members: $5.00
Non-members: $10.00
Pay at the door (cash or checks, no credit cards please)
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| RSVP: |
Email: dhavaljb@ieee.org to RSVP or with questions
You must RSVP to attend
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| Where: |
National Semiconductor
Building 31
955 Kifer Road
Santa Clara, CA 95051
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From San Francisco Airport: Take the Bayshore Freeway 101 (South) toward San Jose, exit on Lawrence Expressway (South), to Kifer Road. Turn right on Kifer Road and locate the National Semiconductor Building 31 (955 Kifer Road).
From San Jose Airport:
Exit (left) on to Guadalupe Parkway. Continue to Bayshore Freeway101 (North), toward San Francisco. Then exit on Lawrence Expressway (South), to Kifer Road. Turn right on Kifer Road locate the National Semiconductor Building 31 (955 Kifer Road). |
| Agenda: |
Light lunch from 11:45 to 12:00 noon
Noon to 1:00 p.m: Yoshio Nishi speaks
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About Yoshio Nishi, Ph.D.
Nishi is the Director of the Stanford Nanofabrication Facility where work focuses on optics, microelectromechanical systems, biology and chemistry, as well as traditional electronics device fabrication and process characterization. He is also Director of Research of the Center for Integrated Systems, and he has been Professor of Electrical Engineering since 2002. Most recently he served as Senior Vice President and Director of R&D and Director of Silicon Technology Development at Texas Instruments. Prior to that Dr. Nishi had a distinguished career at Toshiba and Hewlett Packard and served as a consulting professor at Stanford from 1986 to 2002. Nishi holds a bachelor's degree in Metallurgy from Waseda University and PhD degree in Electronics Engineering from the University of Tokyo, Japan. He is a Fellow of the Institute of Electrical and Electronics Engineers (IEEE), the 1995 IEEE Jack Morton Award winner and the 2002 Robert Noyce Medal recipient.
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