1998 IEEE Lithography Workshop
Welcome to the Twelfth IEEE Lithography Workshop to be held April 13 through 17, 1998 at the Banff Springs Hotel in Alberta, Canada. The Organizing Committee has put together an encompassing technical and social program second to none and we trust you will avail yourself of all the sessions and functions they have planned. (To register call Kenneth Harrison, at 817 379 0970).
The purpose of this Workshop is to share research advances in microlithography theory and practice, with relevance to current and long-term applications of microlithography technology. The Workshop format is intended to provide an atmosphere conducive to in-depth discussion of the invited papers presented in the technical sessions. This will be accomplished by giving each author 25 minutes for the presentation and questions. In order to promote free interchange, there will be no formal proceedings and no picture taking, recording, or references made to the Workshop presentations. The technical sessions have been scheduled for morning and evenings so afternoons can be free for enjoying the Alberta Rockies.
Putting together a meeting such as this required the contributions of many people. We are especially thankful to the chairpersons who have put together the technical program. Each talk is invited and, therefore, each person on the technical program is being recognized for outstanding work in their field.
The Lithography Workshop cooperates with the IEEE Components, Packaging, and Manufacturing Technology Society and gratefully acknowledges the continuing support given by the following companies:
ASM Lithography, Clariant Corp., Cymer Laser, DuPont Photomasks, ETEC Systems Inc., FED Corporation, Hoya Corporation USA, JEOL, JSR Microelectronics Inc., KLA-Tencor, Lambda Physik Inc, Leica Lithography, Micrion Corporation, Nikon Research Corporation of America, Photronics Inc, SAL Inc, SEMATECH, Shipley Company, SVG, Tamarack Scientific Co. Inc, Tropel Corporation, and Ultratech Stepper Inc.
To preserve the workshop atmosphere, attendance will be limited to 150. The Organizing Committee welcomes your comments and suggestions which can help better serve the lithography community. Those wishing to present significant results or appropriate rebuttal information should contact the program chairman: James Greeneich, Tel 602 438 0559.