IEEE Professional Communication Society Newsletter • ISSN 1539-3593 • Volume 52, Number 11 • Dec. '08/Jan. 2009
Calls for Articles/Proposals/Courses

Transactions Special Issue

Open University Discount for PCS members

LeaderPoint Executive Experience

Mentors Needed

IEEE Educational Opportunities

IEEE Transactions on Instrumentation and Measurement Special Issue

IEEE Systems Journal Special Issue

 

10% Discount on Classes through Open University

Website: http://www.open.ac.uk/cpd/index.php?q=node/49

IEEE-PCS members (because of PCS' affiliation with INTECOM) receive a special course fee with the OU, which allows PCS members to study Open University's short web-based CPD courses at a discount of 10% off the published course fee. If you are interested in any of the courses, please click on the relevant link for information about the course and how to register. Read more.

 

Transactions Special Issue

Call for Papers: http://ewh.ieee.org/soc/pcs/index.php?q=node/141
Proposal Due: various

A special issue is planned for the PCS Transactions. Topic is Assessment in Professional Communication.

 

AIIM Certificate courses in ECM Best Practices

Courses: http://www.aiim.org/education/certificate.asp
Location: various locations and online

 

Enterprise Content Management (ECM) is about managing your information assets. It is a framework which enables the management of information assets across an organization, and ties in platforms and programs including:

  • Capture/Imaging
  • Electronic Document Management
  • Electronic Record Management
  • Business Process Management
  • Collaboration
  • Web Content Management
  • Digital Asset Management.

The Enterprise Content Management (ECM) Certificate Program reflects the global best practices in use across our 50,000 members. The program covers the strategies, tools, and technologies used to capture, manage, store, preserve, and deliver information in support of business processes.

  • Learn global best practices for planning and implementing ECM
  • Discover real world solutions and best practices for challenges you face
  • Learn from experts in the field who are able to answer your questions, available to address your comments, and willing to accept your feedback
  • Position yourself to be tomorrow's leader by enhancing your business and professional skills

 

LeaderPoint Executive Experience

Courses: http://www.leaderpoint.biz/ieee.htm
Educational Partnerships: www.ieee.org/partners
Location: Kansas City, Missouri USA

LeaderPoint, a company specializing in executive and management development sessions and newest member to the IEEE Education Partners Program, is offering members a 10% discount on its Executive Experience session. The session, a five-day, comprehensive development program designed to advance leadership and management skills, is held in Kansas City, Mo. The Executive Experience will help participants gain the following skills:

  • Build cooperation in seizing opportunity and gaining greater commitment
  • Practice using systematic tools for strategic planning
  • Diagnose and correct dysfunctional group dynamics
  • Focus personal development in specific areas
  • Develop a management mindset for improving business results

Each session has an assessment component which provides a summary of LeaderPoint's observations, the participant's comments, and specific recommendations.

Participants can contact LeaderPoint at any time for follow-up work, questions, and concerns. For more information on LeaderPoint visit http://www.leaderpoint.biz/ieee.htm. For general information on the IEEE Education Partners Program visit www.ieee.org/partners.

 

Mentors Needed

Website: http://www.leaderpoint.biz/ieee.htm
Contact: www.ieee.org/partners

The IEEE Mentoring Connection is looking for "online" mentors to help guide younger IEEE professionals in career planning and professional development. Currently, 989 mentees, but only 440 mentors have registered to participate.

Mentor participation is open to all IEEE members above the grade of Student Member. Soon, we will be inviting Graduate Student Members to join the program. These members have graduated with their first professional degree and are presently in a graduate program (Masters, MBA, PhD, etc.). We will need additional mentors in the program to handle the requests from this new group. We need you!

Presently our mentors represent the following positions:

  • Associate Dean and Professor
  • Director of Engineering
  • Senior Sales Engineer
  • Project Manager
  • Corporate Owner
  • Consultant
  • R&D Technical Manager
  • Licensing Manager
  • Division Manager - Control Systems
  • Electrical Engineer
  • Vice President Research
  • Director - Customer Operations
  • Computer Scientist - Branch Chief
  • Senior Product Development Engineer
  • Design Engineer - Power
  • Retired

If you have received an invitation to join the program and been thinking about it, now is the time to join. If you have already signed in as a mentor - thank you for participating.

Gary Hinkle, a mentor in the program, says "Helping young engineers develop in their careers is very rewarding. Working with some of these individuals has proven to be quite a challenge, because of the diversity among those seeking mentors. I'm glad to be contributing to this program."

The program enables the mentee to select their mentoring partner online from a list of individuals who have volunteered to serve as mentors. After mentors are identified as a potential match, they are contacted and asked to begin establishing a relationship.

Interested members can visit http://www.ieee.org/mentoring for information on the roles and responsibilities of each mentoring partner, including additional program information and an FAQ page. Potential mentors are asked to review the time and effort commitment to the program necessary to ensure a successful mentoring partnership. To enter the program website, please go to http://www.mentoringconnection.com and use the IEEE Group ID "IEEE2006" to enter for the first time. Once in, you will need to set your own User ID and Password.

If you have any questions, please contact Cathy Downer, Regional Activities, at c.downer AT ieee DOT org.

 

Educational Opportunities from IEEE

Online Courses: Expert Now
http://ieeexplore.ieee.org/modules.modulebrowse.jsp
Educational Partnerships: http://www.ieee.org/web/education/partners/eduPartners.html
CEUs http://www.ieee.org/web/education/ceus/index.html

 

Staying technically current in today's ever-changing workplace is a career must if you want to maintain your professional edge or your P.E. license as required by more than 30 states in the US. IEEE offers an innovative new product called Expert Now as well as a growing service, Education Partners Program to help meet your continuing professional development needs.

Expert Now is a collection of over 65, one-hour long, interactive online courses on a variety of topics, including, but not limited to, the following:

  • aerospace
  • circuits & devices
  • communications
  • computing
  • laser & optics
  • microwave theory & techniques
  • power
  • reliability
  • signal processing
  • software.

Presented by experts in the field, each course brings to your desktop the best tutorial content IEEE has to offer through its technical meetings that take place worldwide. Continuing Education Units (CEUs) can be earned upon successful completion of the assessment. To review the course catalog visit http://ieeexplore.ieee.org/modules.modulebrowse.jsp.

For those looking for a more robust educational experience, more along the lines of a longer online course, or a more traditional classroom setting, the IEEE Education Partners Program can prove helpful in your search for continuing professional development opportunities. Exclusive for IEEE members, it provides access to more than 6,000 online courses, certification programs, and graduate degree programs at up to a 10% discount from academic and private providers that IEEE has peer reviewed to accept into the program. To review the current list of partners participating in the program visit http://www.ieee.org/web/education/partners/eduPartners.html.

Another way to browse for a course or educational events taking place in your area is through the courses registered with IEEE to offer CEUs. To review what's available in your area visit http://www.ieee.org/web/education/ceus/index.html. IEEE is an Authorized provider of CEUs through the International Association for Continuing Education and Training, as well as an authorized provider of CEUs for the Florida State Board. IEEE CEUs are also accepted by the New York State Board, and can easily be converted into PDHs. One CEU is equal to 10 contact hours of instruction in a continuing education activity. IEEE CEUs readily translate into Professional Development Hours (PDHs) (1 CEU = 10 PDHs).

For more general information on IEEE's Continuing Education products and services, visit http://www.ieee.org/web/education/home/index.html. Specific inquiries can be directed to Celeste Torres via email, c.torres AT ieee.org, or by phone +1 732 981 3425.

 

IEEE Transactions on Instrumentation and Measurement
Special Issue on Biometric Instrumentation and Measurement

Call for Papers: http://www.dti.unimi.it/~piuri/pages/TIM-SpecialIssueBiometricIMCFP.pdf
Submission Period: February 15 - March 1, 2009
Publication Date: December 2009

Biometrics is a growing and important applications area receiving significant interest as a result of the criticality and the social impact of its applications. In addition, the increasing worldwide interest in security makes biometrics even more valuable and desirable, from many perspectives including its theory, technologies, design methodologies, and applications. The constituencies that may benefit from this ever growing field include academia, industry, government, and the general public.

To create a biometric system various issues need to be studied in a comprehensive and integrated way: from sensing to measurement procedures, from signal analysis and interpretation to quality assessment, from feature extraction to classification and analysis, from knowledge creation to extraction, and much more. Integration and cooperative combination are other key aspects of biometrics applications.

This special issue is focused on publishing original papers that address instrumentation and m! easureme nt aspects of the design, implementation and applications of biometrics. Guest Editors of this special issue are: Fabio Scotti, University of Milan, Italy; David Zhang, The Hong Kong Polytechnic University, Hong Kong; Evangelia Micheli-Tzanakou, Rutgers University, USA.

Questions about the special issue should be directed to Dr. Fabio Scotti (fabio.scotti@unimi.it).p>

 

IEEE Systems Journal Special Issue on Biometrics Systems

Call for Papers: http://www.d! ti.unimi .it/~piuri/pages/ISJ-SpecialIssueBiometricsSystemsCFP.pdf
Proposal Due: January 15, 2009
Publication Date: August 2009

The increasing needs for security as well as medical diagnosis make biometrics more and more valuable world-wide, both as theory, technologies, design methodologies, and applications are concerned. To create a biometric system various issues need to be studied in an integrated way: from sensing to measurement procedures, from signal analysis and interpretation to quality assessment, from feature extraction to classification and analysis, from knowledge creation to extraction, from algorithms to data structure, from computational complexity to system performance, from system engineering to software engineering, from privacy to social implications, and much more. Integration and cooperative combination are another key aspects if biometrics systems and applications.

This special issue is directed to collect original papers that address any aspect of the design, implementation and application of biometrics systems, by focusing on a system-level perspective. Guest Editors of this special issue are: Vincenzo Piuri, University of Milan, Italy; Jie Tian, Chinese Academy of Sciences, China; and Evangelia Micheli-Tzanakou, Rutgers University, USA.

Questions about the special issue should be directed to Prof. Vincenzo Piuri (vincenzo.piuri@unimi.it).