All-MOCVD Technology for YBCO Layer/Buffer Layer
Fabrication for Coated Conductors

A. Molodyk, M. Novozhilov, S. Street,
A. Delaney, L. Castellani, A. Ignatiev

Abstract — The deposition of all buffer and YBCO layers for coated conductors via MOCVD represents one of the lowest possible capital and operational cost approaches to coated conductor manufacturing. Modular design of our prototype MOCVD system allows for either in-line or parallel fabrication of any number of buffer layers and YBCO layers. World class results of J_c = 3.34 MA/cm², I_c = 480 A/cm on short samples, and
I_{c, max} > 300 A/cm on 1 m long tapes have been achieved in MOCVD YBCO on established PVD buffer layer architectures. I_c > 130 A/cm has been reproducibly demonstrated on all-MetOx all-MOCVD architecture, the best up-to-date result being I_c = 151 A/cm.

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