Plenary Speaker

Semiconductor Scaling for the Next Decade Enabled by Holistic Lithography

Michael Lercel (ASML)

Experience:

• 2015-Present – ASML
• 2012-2015 – SEMATECH Chief Scientist
• 2010-2012 – Cymer, Product marketing EUV sources
• 2005-2008 – SEMATECH Lithography director
• 1996-2010 – IBM, advanced masks, lithography research, semiconductor equipment selection

Biography: Experience in many parts of semiconductor manufacturing with particular emphasis on lithography and patterning topics. Has worked on many “next generation lithography” techniques – including first EUV work in 1998. PhD in physics from Cornell University in using ebeam lithography on monomolecular self-assembled films. Currently working on corporate strategy, product portfolio, and (as always) customer impact