Invited Speaker

The Effect of Stress on HfO2-based Ferroelectric Thin Films: A Review of Recent Advances

Peichen Hong (Chinese Academy of Sciences)

Biography:Dr. Peizhen Hong has been an Associate Researcher at the Institute of Microelectronics, Chinese Academy of Sciences, since 2019. She is a member of Youth Promotion Association, Chinese Academy of Sciences. She Participated in national 02 special 22nm process integration technology, 16/14nm bulk silicon FinFET and key process research, national memory base of 3D NAND flash memory and other projects in China. She has applied for more than 40 patents and published more than 20 papers. Her research interests focus on advanced memory device and fabrication, including 3D NAND and HfO2-based ferroelectric memory.