Invited Speaker

Advanced Atomic Layer Deposition

Tae Joo Park (Hanyang University)

Biography: Professor Tae Joo Park received the B. Eng and Ph. D degree in Materials Science and Engineering from the Seoul National University, Seoul, Korea, in 2002 and 2008, respectively. His research at Seoul National University covered electrical and chemical characterizations of advanced gate stacks with metal gate/high-k/high mobility channel and non-volatile memory applications as well as thin film growth using atomic layer deposition. From 2008 to 2010, he was a research scientist of the Materials Science and Engineering department at the University of Texas at Dallas, where he was involved in advanced nano-electronic devices based on organic/inorganic thin films, graphene layer growth, and in-situ XPS analysis of thin films. Since 2011, he is currently a professor in the Hanyang University, Korea. He has published more than 150 papers in technical journals with more than 240 presentations in international conferences. His research interests include nano-electronic devices, advanced ALD processes and energy storage systems.