Today and tomorrow of expanding Nanoimprint Lithography
Biography: Mr. Yukio Takabayashi is a Director of the NGL Development Center for Semiconductor Manufacturing Equipment of Canon Inc. He has been involved in the development of i-line stepper, KrF scanner and advanced exposure equipment for more than 35 years since joining the company. Since 2009, he has led the project as head of product development for FPA -1200 NZ 2 C, the latest NIL tool, and has been involved in the technology and equipment development of nanoimprint lithography. Mr. Takabayashi holds a Master's degree in Mechanical Engineering from Graduate School of Engineering, Keio University.