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Technical Seminar


Integrated Circuit Intrinsic Reliability

DATE/TIME  Wednesday, February 16, 2005 (5:30pm to 7:30pm)
PLACE  Physiology Bldg. Room 243 (2nd floor) (CSU, Fort Collins, CO)
DIRECTIONS
  • To Colorado State University

  • To Physiology Building (note change from Physiology 103 to Physiology 243)

  • Physiology Building is on the south side of campus, at the NE corner of Centre Avenue and Lake Street.  From I-25, it is easiest to take Prospect Road westbound.  After passing College Avenue, turn right onto Centre Avenue and park at parking lot on right side of road before reaching Lake Street.  

  • Park south of Physiology Building -- free after 4pm

COST    Free.  As always, pizza & drinks will be provided.

ABSTRACT  The scaling of silicon integrated circuits to the deep submicron realm has presented challenges to maintaining the long-term reliability of these devices.  In the past, the wearout mechanisms of silicon devices typically began long after the useful life of the product was over.  With the scaling down of both the transistors and the metallization, the onset of wearout is becoming increasingly close to the expected life of the product.  The integrated circuit wearout mechanisms discussed are hot carrier injection (HCI) gate oxide wearout, negative bias temperature instability (NBTI), electromigration, and stress migration.  HCI and NBTI cause changes in parameters (such as Vt, Gm, and drain current) of individual transistors.  The others can cause changes in circuit characteristics or catastrophic circuit failure, such as a short or open.  This presentation discusses the causes of the wearout phenomenon, its effect on the individual transistor and possible effects on the circuit, and how it is measured.  It then discusses steps a designer can take to account for device degradation and mitigate its effect.
PRESENTATION SLIDES  pdf

DR. DENNIS EATON (Agilent Technologies, Fort Collins, CO)

Dennis Eaton received the BS degree in physics from Harvey Mudd College, Claremont,CA, and the MS and PhD degrees in physics from the University of Illinois, Urbana-Champaign, IL.  He then joined Bell Labs where he worked on bipolar integrated circuits and metallization.  In 1976, Dr. Eaton joined Hewlett-Packard Company, working in MOS technology and processing.  He later held management positions in silicon process development and manufacturing.  Since 1984, Dr. Eaton has held engineering and management positions in semiconductor device and product reliability at Hewlett-Packard and Agilent Technologies.  He has been responsible for reliability testing, device reliability, and reliability estimation.  He has authored papers on process technology, process control, and reliability.  Dr. Eaton is a member of IEEE and the American Society for Quality (ASQ).  He is a Certified Reliability Engineer of the ASQ.

PHOTOS  Courtesy of Bob Barnes & Don Morris