IEEE Navigational Bar IEEE Home Search IEEE Join IEEE About IEEE

DENVER SECTION

Home

Upcoming Events

Past Events

Meeting Schedule

Mailing List

Officers

Links

Technical Seminar

Distinguished Lecturer Series


Negative Bias Temperature Instability (NBTI): Physics, Materials, Process and Circuit Issues


DATE/TIME  Thursday, August 11, 2005 (4:30-6:00pm)
PLACE  Bldg. 1 Auditorium (Agilent Technologies, Fort Collins, CO)

DIRECTIONS  From I-25, take Harmony Road Exit (Exit 265) westbound, and enter Agilent/HP campus on right.  Agilent/HP campus is on the NE corner of Harmony Road and Ziegler Road.  Proceed to Bldg. 1 Lobby to sign-in and meet host for escort to Auditorium.

Non-Agilent/HP/Intel Attendees:  Please arrive punctually at 4:15pm as you will need to be escorted to the seminar room.  We appreciate a courtesy RSVP to bob_barnes@agilent.com to expedite sign-in and to help us with a headcount estimate for food/drinks.

ABSTRACT

In this talk I will present an overview of negative bias temperature instability (NBTI) commonly observed in p-channel MOSFETs when stressed with negative gate voltages at elevated temperatures.  The talk will concentrate on the physics, materials, process, and some circuit issues, e.g., dc versus ac stress.  I discuss the results of such stress on device performance and review interface traps and oxide charges, their origin, and present understanding of NBTI.  Next I discuss the effects of varying parameters (hydrogen, nitrogen, water, fluorine, deuterium, boron, temperature, electric field, and gate length) on NBTI and conclude with NBTI and minimization.
PRESENTATION SLIDES  pdf

PROF. DIETER K. SCHRODER (Arizona State University, Tempe, AZ)
Dieter K. Schroder has worked with semiconductor material and device electrical characterization for the last 35 years.  He received his education at McGill University, Montreal, Canada, and at the University of Illinois, Urbana-Champaign, IL.  He joined the Westinghouse Research Labs in 1968 where he was engaged in research on various aspects of semiconductor devices, including MOS devices, imaging arrays, power devices, and magnetostatic waves.  He spent a year at the Institute of Applied Solid State Physics in Germany during 1978.  In 1981, he joined Arizona State University in the Center for Solid State Electronics Research.  His current interests are semiconductor devices, defects in semiconductors, semiconductor material and device characterization, low power electronics, and device modeling.  He has written two books Advanced MOS Devices and Semiconductor Material and Device Characterization, has published over 150 papers, has graduated 91 graduate students, has given many short courses and is a Life Fellow of IEEE.
Website

PHOTOS  Courtesy of Bob Barnes