Measuring the deflection of CMOS micromachined cantilever devices using a piezoresistive sensor
Yuan Ma, Alexander M. Robinson, Ron P.W. Lawson, Keith B. Brown, Derek Strembicke, Walter Allegretto, and Tiansheng Zhou
Surface-micromachined reconfigurable multi-slit mask
S. Bakshi, M. Parameswaran, M. Syrzycki, and D. Crampton
Micromachined silicon collimating detector array to view objects in a highly scattering medium
Moninder S. Tank and Glenn H. Chapman
Mask-under-etch characterization of Si{110} in TMAH
A. Pandy, L.M. Landsberger, and M. Kahrizi
An IC-compatible process for fabrication of RF switches and tunable capacitors
R.N. Tait
CMOS-compatible high-temperature micro-heater: Microstructure release and testing
O. Grudin, R. Marinescu, L. Landsberger, D. Cheeke, and M. Kahrizi
Gas-phase xenon difluoride etching of microsystems fabricated through the Mitel 1.5-µm CMOS process
P. Muthukumaran, I. Stiharu, and R.B. Bhat
Pressure measurement using hysteresis effects in cantilever microstructures
K.B. Brown, Y. Ma, A. Garcia, W. Allegretto, R.P.W. Lawson, F.E. Vermeulen, and A.M. Robinson
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